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G1 Fab

Address

Room 405, 474, Dunchon-daero, Jungwon-gu, Seongnam-si, Gyeonggi-do, Republic of Korea

Manufacturing Capability

Mass Production Facility for Ga₂O₃ Arc Detection Sensors

Process Coverage

Full wafer front-end processing capability

Monthly Capacity

100 wafers per month (4-inch wafer standard)

Cleanroom Specification

100Class
Deposition Room
Photolithography Room
Equipment List
  • DC / RF Magnetron Sputtering System
  • Plasma Surface Treatment System
  • Rapid Thermal Annealing (RTA) System
  • Atomic Layer Deposition (ALD) System
  • Probe Station
  • Mask Aligner
  • Wet station
  • Semi-Automatic Spin Coater
  • Semi-Automatic Spin Developer
  • Fume Hood
  • Ultrasonic Cleaner
  • Hot Plate
  • Deionized (DI) Water Generation System
  • Laboratory Oven